Β) ΔΗΜΟΣΙΕΥΣΕΙΣ ΣΕ ΔΙΕΘΝΗ ΣΥΝΕΔΡΙΑ ΜΕ ΚΡΙΤΕΣ.

[1] Total enhancement factor for EPMA analysis of stratified materials: Experiments and Monte Carlo calculations.

J. Cazaux, O. Jbara, A. G. Nassiopoulos, E. Valamontes

ICXOM 12, 1989, Gracow, p201.

[2] Thickness profiling of overlayers on substrates by X-ray analysis and Auger formalism.

O. Jbara, J. Cazaux, X. Thomas, A. Nassiopoulos, E. Valamontes

ECASIA (1989) Antibes, France, p266.

[3] Contribution of the X-ray Induced Auger Electrons in Quantitative Auger Electron Spectroscopy calculated by Monte-Carlo techniques.

E. Valamontes, A. G. Nassiopoulos.

ECASIA (1989) Antibes, France, p130.

[4] Scanning X-ray microfluorescence in a SEM for the analysis of very thin overlayers.

E. Valamontes, A. G. Nassiopoulos

Proceed. III Balkan Congress on Electron Microscopy, Athens, Greece 1989, page 267.

[5] Use of the SEM for thickness measurements, with a submicron resolution, of thin silicides, grown on silicon.

A. G. Nassiopoulos, T. Travlos, D. Tambouris, E. Valamontes

Proceed. III Balkan Congress on Electron Microscopy, Athens, Greece 1989, page 285.

[6] Backscattering and X-ray induced correction factors in EPMA (EDX) analysis of stratified materials.

A. G. Nassiopoulos, E. Valamontes

Proceed. III Balkan Congress On Electron Microscopy, Athens, Greece 1989, page 188.

[7] Experimental determination of the total enhancement factor in X-Ray microanalysis of thin overlayers.

A. G. Nassiopoulos, E. Valamontes, T. Travlos, C. Tsamis.

XII Inter. Congr. for Electron Microscopy (1990), Ohio, USA, p218.

[8] High Spatial Resolution in Scanning Auger Microscopy and X-ray Microanalysis.

A. G. Nassiopoulos, N. Glezos, E. Valamontes.

ECASIA (1991), Budapest, Hungary.

[9] Electron Probe Microanalysis of thin overlayers. Different contributions to the total signal and point-to-point resolution, calculated by Monte-Carlo    calculations.

E. Valamontes and A. G. Nassiopoulos.

European Congress on Energy Dispersive X-ray Analysis.

Myconos, May 1992.

[10] Comparative study of back-foil X-ray fluorescence and Electron Probe Microanalysis for the characterisation of very thin overlayers.

A. G. Nassiopoulos, E. Valamontes, N. Grammaticas, D. Philippou and D. Fragogiannis.

European Congress on Energy Dispersive X-ray Analysis.

Myconos, May 1992.

[11] Electron Probe X-ray Microanalysis of coatings. Sensitivity and Resolution.

E. Valamontes, A. G. Nassiopoulos.

European Microbeam Analysis Society-4th European Workshop.

Saint Malo (France), May 1995.

[12] Comparison of back-foil Scanning X-ray Microfluorescence and Electron Probe X-ray Microanalysis for the elemental characterisation of thin coatings.

E. Valamontes, A. G. Nassiopoulos.

Εuropean Microbeam Analysis Society-4th European Workshop.

Saint Malo (France), May 1995.

[13] Application of the Boltzmann transport equation in the thickness determination of thin films.

G. Kaltsas, N. Glezos, E. Valamontes and A. G. Nassiopoulos.

European Microbeam Analysis Society-4th European Workshop.

Saint Malo (France), May 1995.

[14] Optical properties of undoped phosphorus doped and oxidised LPCVD polycrystalline silicon films obtained by transmission and FTIR measurements.

D.Davazoglou, D. Kouvatsos, E. Valamontes

14^th ICVD Symp. - 11^th EUROCVD Confer., Paris, France, 1997.

[15] WO₃ LPCVD thin films for integrated gas sensor application.

D. Davazoglou, A. Moustakis, K. Georgouleas, E. Valamontes, D. Tsamakis

14^th ICVD Symp. - 11^th EUROCVD Confer., Paris, France, 1997.

[16] Effect of silicon surface pre-oxidation on porous silicon formation.

P. Photopoulos, A.G. Nassiopoulos, E. Valamontes.

II International workshop on light emitting low dimensional silicon structures.

Athens, Greece, 1997.

[17] Improved design of a multi groove vacuum pump compressing directly to the air.

E. S. Valamontes, S. E. Valamontes and C. N. Panos.

American Vacuum Society, 45^th International Symposium, 77, USA, (1998).

[18] Simulation of roughness and free volume in chemically amplified resists using percolation theory.

G. Patsis, N. Glezos, I. Raptis and E. Valamontes.

43^th Electron and Photon Beam Technology and Nanofabrication

Conference, USA, 1999

[19] Surface and line-edge roughness in wet and dry developable negative tone systems: Experiment and simulation.

G. Patsis, A. Tserepi, E. Valamontes, E. Gogolides and I.Raptis.

44^th Electron and Photon Beam Technology and Nanofabrication

Conference, USA, 2000.

[20] Surface and line-edge roughness in dry developable resists.

A. Tserepi, E. Valamontes, E. Tegou, I.Raptis and E. Gogolides.

MNE-2000, Jena, Germany

[21] Plasma etching of Si-containing polymers for 193-157 nm lithography.

A. Tserepi, G. Cordoyiannis, K. Boukouras, E. Valamontes, I.Raptis,

E. Gogolides, D. Eon, M. Peignon, C. Cardinaud and G. Turban.

International Congress for Plasma Processing, France 2001.

[22] Characterisation and simulation of surface and line-edge roughness in photoresists.

V. Kostantoudis, E. Gogolides, G. Patsis, A. Tserepi, E. Valamontes.

45^th Electron and Photon Beam Technology and Nanofabrication

Conference, USA, 2001.

[23] Roughness characterization in positive and negative resists.

V. Costantoudis, E. Gogolides, A. Tserepi, C. D.  Diacoumakos,

E. S. Valamontes.

MNE-2001, France.

[24] Control of surface and line-edge roughness induced by plasma etching of Si-containing polymers

A. Tserepi, E. Gogolides, V. Costantoudis, G. Cordoyiannis

E. S. Valamontes, O. Brani, E. Tegou.

ESCAMPIG-ICRP 2002, France.

[25] Resist Plasma Etching for 157 nm lithography.

D. Eon, G. Cartry, M. Peignon, C. Cardinaud, A. Tserepi,G. Cordoyiannis, E. Valamontes, I.Raptis and E. Gogolides.

29^th IEEE International Conference on Plasma Science.

Alberta, Canada 2002.

[26] Surface roughness induced by plasma etching on Si-containing polymers.

A.Tserepi, E. Gogolides, V. Costantoudis, G.Cordoyiannis, O. Brani and E. Valamontes.

 Second International Symposium on Polymer Surface Characterization Florida,

USA 2002.

[27] Backscattering and X-Ray induced correction factors in EPMA (EDX) analysis of stratified materials.

E. S. Valamontes

7th International Conference on Electron Beam Technologies

Varna, Bulgaria 2003.

[28] Scanning X-Ray Microfluorescence in a SEM for the analysis of very thin overlayers.

E. S. Valamontes

7th International Conference on Electron Beam Technologies

Varna, Bulgaria 2003.

[29] Etching behavior of Si-containing polymers as resist materials for bilayer lithography.

A. Tserepi, G. Cordoyiannis, G.P. Patsis, V. Constantoudis, E. Gogolides,I. Raptis and E. Valamontes (invited paper).

Fourth International Symposium on Polymer Surface Modification

Toronto, Canada 2003.

[30] Dissolution properties of ultrathin photoresist films for the fabrication of nanostructures.

I. Raptis and E. Valamontes

Nano and Giga Challenges in Microelectronics, Krakow, Poland 2004.

[31] Modification of polymer swelling by UV irradiation for use in chemical sensing.

D. Goustouridis, S. Chatzandroulis, I. Raptis and E. Valamontes.

Third IEEE International Conference on Sensors, Vienna, Austria 2004.

[32] Proton beam micromachining on strippable aqueous base developable negative resist.

I. Rajta, E. Baradacs, M. Chatzichristidi, E. S. Valamontes and I. Raptis.

Ninth International Conference on Nuclear Microprobe Technology andApplications

Dubrovnik, Croatia 2004.

[33] Dissolution properties of ultrathin photoresist films for the fabrication of nanostrucrures.

A. Kokkinis, E. S. Valamontes, I. Raptis

MMN Conference, Athens, Greece 2004.

[34] Dissolution properties of ultrathin photoresist films with multiwavelength  interferometry.

A. Kokkinis, I. Raptis, J. C. Statharas and E. Valamontes (invited paper).

Fifth International Symposium on Polymer Surface Modification

Toronto, Canada 2005.

[35] Backscattering, X-Ray induced correction factors and spatial resolution in

EPMA (EDX) analysis of stratified materials.

E. S. Valamontes.

IUMAS-3 and EMAS-9, Florence, Italy, 2005.

[36] Scanning X-Ray Microfluorescence in a SEM for the analysis of very thin overlayers.

E. S. Valamontes and J. C. Statharas.

IUMAS-3 and EMAS-9, Florence, Italy, 2005.

[37] Injection of point defects during annealing of low energy As implanted silicon.

C. Tsamis, D. Skarlatos, V. Valamontes, D. Tsoukalas, G. BenAssayag,

A. Claverie  and W. Lerch

E-MRS 2005, Spring Meeting, Strasbourg, France, 2005.

[38] Fractal structures in nanoelectronics.

V. Constantoudis, G. P. Patsis, A. Tserepi, K. Tsougeni, G. Boulousis, E. Valamontes and E. Goggolides

XXV Dynamics Days Europe, Berlin, Germany, 2005.

[39] UV irradiation as a means of engineering polymer swelling properties used  in chemical sensors

D. Goustouridis, S. Chatzandroulis, I. Raptis and E. Valamontes.

Instrumental Methods of Analysis,

Iraklion, Crete, Greece, 2005.

[40] Proton beam micromachined channels in negative tone resist materials.

I. Rajta, M. Chatzichristidi, E. Baradács, Gy. Deák, I. Raptis, E. Valamontes.

International Conference on Nuclear Microprobe Technology and Applications,

Singapore 2006.

[41] Scanning XRF in a SEM for the analysis of very thin overlayers.

E. S. Valamontes and J. C. Statharas

European Conference on X-Ray Spectrometry,

Paris, France 2006.

[42] Electron Beam lithography simulation on EUV mask blank.

N. Tsikrikas, G. P., Patsis, I. Raptis, E. S. Valamontes, N. Glezos

8th International Conference on Electron Beam Technologies,

Varna, Bulgaria 2006.

[43] Comparison of Back-Foil SXRF and EPMA for the Elemental Characterization of Thin Coatings.

E. S. Valamontes and J. C. Statharas

IMC16, Sapporo, Japan 2006.

[44] Sensitivity and Lateral Resolution of Scanning X-Ray Microfluorescence for the Analysis of Very Thin Overlayers.

E. S. Valamontes, J. C. Statharas and C. Nomicos

9th CIASEM, Cuzco, Peru, 2007.

[45] Modification of Surface Topography and Wetting Properties of Oxygen-Plasma Treated Polydimethylsiloxane (PDMS).

A. Tserepi, K. Tsougeni, E. Valamontes, V. Constantoudis, I. Raptis and E. Gogolides.

9th International Symposium on Polymers for Advanced Technologies,

Shanghai, China 2007.

[46] High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically amplified resists.

M. Chatzichristidi, E. Valamontes, I. Raptis, J. A. van Kan, F. Watt (invited paper).

33rd Int. Conference on Micro- and Nano-Engineering,

Copenhagen, Denmark, 2007.

[47] Realization and Simulation of High Aspect Ratio Micro/Nano Structures by Proton Beam Writing.

M. Chatzichristidi, E. Valamontes, I. Raptis, J. A. van Kan, F. Watt.

MNC 2007,  Kyoto, Japan.

[48] Electron Beam Lithography Simulation for The Patterning of EUV Masks.

N. Tsikrikas, G. P. Patsis, E. Valamontes, I. Raptis and A. Gerardino.

MNC 2007,  Kyoto, Japan.

[49] Simulation of Proton Beam High-Aspect-Ratio Micro/Nano Machining.

E. Valamontes, M. Chatzichristidi, C. Potiriadis, D. Kotsiampasis, D. Niakoula, A. Karydas, S. Harissopoulos, D. Goustouridis, I. Raptis.

International Conference on Nuclear Microprobe Technology and Applications, Debrecen 2008.