Α) ΔΗΜΟΣΙΕΥΣΕΙΣ ΣΕ ΔΙΕΘΝΗ ΠΕΡΙΟΔΙΚΑ ΜΕ ΚΡΙΤΕΣ.

[1] Back scattering and X-ray induced correction factors for AES of thin overlayers: Influence on lateral Resolution.

E. Valamontes, A. G. Nassiopoulos, N. Glezos.

Surface and Interface Analysis, Vol. 16, 203, 1990.

[2] Monte Carlo calculations of the X-ray induced enhancement signal in EPMA and AES of stratified materials.

A. G. Nassiopoulos, E. Valamontes

Surface and Interface Analysis, Vol. 15, 405, 1990.

[3] Monte-Carlo calculations of the spatial resolution in X-ray Microanalysis of thin overlayers in the energy range 20-100keV.

A. G. Nassiopoulos, E. Valamontes.

Microbeam Analysis, Vol. 25, 161, 1990.

[4] Film thickness distribution and thickness measurements of buried layers using the Electron Probe Microanalysis.

A. G. Nassiopoulos, E. Valamontes

Microscopy of Semiconducting Materials.

Inst. Phys. Conf. Ser. No.93, Vol. 2, Chap.4, 157, 198

[5] Point-to-Point Resolution in X-ray Microanalysis of thin coatings in the energy range 20-100keV.

A. G. Nassiopoulos, E. Valamontes.

Microscopy of Semiconducting Materials,Inst. Phys. Conf. Ser. No 117, Vol. 2, 75, 1991.

[6] Monte-Carlo simulations of the point-to-point resolution in scanning Auger microscopy and X-ray Microanalysis of thin overlayers.

E. Valamontes, A. G. Nassiopoulos, N. Glezos

Surface and Interface Analysis, Vol. 19, 419, 1992.

[7] The turbomolecular Pump in Molecular State.

A. G. Antoniou, S. E. Valamontes, C. N. Panos, E. S. Valamontes.

Vacuum, Vol. 46, No 7, 709, 1995.

[8] Electron  Probe X-ray Microanalysis of coatings.

E. Valamontes, A. G. Nassiopoulos.

Mikrochemica Acta, Vol. 13, 605, 1996.

[9] Comparison of back-foil Scanning X-ray Microfluorescence and Electron Probe X-ray Microanalysis for the elemental characterisation of thin coatings.

E. Valamontes, A. G. Nassiopoulos.

Mikrochemica Acta, Vol. 13, 597, 1996.

[10] Application of the Boltzmann transport equation in the thickness determination of thin films.

G. Kaltsas, N. Glezos, E. Valamontes and A. G. Nassiopoulos.

Mikrochemica Acta, Vol. 13, 349, 1996.

[11] The helicoid multi-groove molecular and the turbomolecular vacuum pumps in Molecular State under the scope of statistical behaviour of molecules.

E. S. Valamontes, C. N. Panos, A. G. Antoniou, S. E. Valamontes.

Vacuum, Vol. 47, No 11, 1361, 1996.

[12] Tungsten oxide thin films chemically vapor deposited at low pressure by W(CO)₆ pyrolysis.

D. Davazoglou, A. Moutsakis, V. Valamontes, V. Psycharis, D. Tsamakis.

J. Electrochem. Soc., Vol. 144, No 2, 595, 1997.

[13] Microanalysis of Coatings.

E. Valamontes.

Chem. Chronik., Vol. 26, No 1, 19, 1997.

[14] Comparison of SXRF and EPMA for the elemental characterisation of thin coatings.

E. Valamontes.

Chem. Chronik., Vol. 26, No 1, 29, 1997.

[15] Optical properties of undoped, phosphorus doped and oxidised LPCVD polycrystalline silicon films obtained by transmission and FTIR measurements.

D.Davazoglou, D. Kouvatsos, E. Valamontes

Electrochem. Soc. P., Vol. 97-25, 796, 1997.

[16] WO₃ LPCVD thin films for integrated gas sensor applications.

D. Davazoglou, A. Moustakis, K. Georgouleas, E. Valamontes, D. Tsamakis

Electrochem. Soc. P., Vol. 97-25, 968, 1997.

[17] Electron beam lithography on multilayer substrates: experimental and theoretical study.

I. Raptis, G. Meneghini, A. Rosenbusch, N. Glezos, R. Palumbo, M. Ardito,L. Scopa, G. Patsis, E. Valamontes, P. Argitis

SPIE Microlithography Vol. 3331, 431-441, (1998).

[18] Size selection by cluster deflection in an electric field.

A. C. Xenoulis, P. Tsouris, G. Doukelis, N. Boukos, E. Valamontes,Y. Chen. T. Tsakalakos.

Nanostructured Materials, Vol. 8, No 7, 771, (1997).

[19] Thickness determination of thin films based on X-ray signal decay law.

G. Kaltsas, N. Glezos, E. Valamontes, A. G. Nassiopoulos.

Surf. Interf. Analysis, 26, 876-884 (1998).

[20] The helicoid multi groove frictional pump as a direct compressor in the atmosphere under re-examination of the coefficient of the internal viscosity.

S. E. Valamontes, C. N. Panos and  E. S. Valamontes.

Vacuum, Vol 53, 421, (1999).

[21] Simulation of roughness in chemically amplified resists using percolation theory.

G. Patsis, N. Glezos, I. Raptis and E. Valamontes.

J. Vac. Sci. Technol. B 17 (6), 3367, (1999).

[22] Electron beam lithography simulation for high resolution and high-density patterns.

I. Raptis, N. Glezos, E. Valamontes, E. Zervas, P. Argitis.

Vacuum 62, 263-271, (2001).

[23] Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation.

G. Patsis, A. Tserepi, I.Raptis, N. Glezos, E. Gogolides and E. Valamontes.

J. Vac. Scien. & Technol. B 18 (6), 3292, (2000).

[24] Surface and line-edge roughness in plasma developed resists.

A. Tserepi, E. Valamontes, E. Tegou, I.Raptis and E. Gogolides.

Microelectronic Engineering, Vol. 57-58, 547-554, 2001.

[25] Influence of texture on the absorption threshold of LPCVD silicon films.

D. Davazoglou, D. N. Kouvatsos and E. Valamontes.

J. de Physique IV, Vol. 11, Pr3-1029, (2001).

[26] Characterization and simulation of surface and line-edge roughness in photoresists.

V. Costantoudis, E. Gogolides, G. Patsis, A. Tserepi, E. Valamontes.

J. Vac. Scien. & Technol. B, 19 (6), 2694, (2001).

[27] Roughness characterization in positive and negative resists.

V. Costantoudis, E. Gogolides, A. Tserepi, C. D.  Diacoumakos,E. S. Valamontes.

Microelectronic Engineering, Vol. 61-62, 793-801, (2002).

[28] Surface modification of Si-containing polymers during etching for bilayer lithography.

D. Eon, L. de Poucques, M. Peignon, C. Cardinaud, G. Turban, A. Tserepi, G. Cordoyiannis, E. Valamontes, I.Raptis and E. Gogolides.

Microelectronic Engineering, Vol. 61-62, 901-906, (2002).

[29] Etching behaviour of Si-containing polymers as resist materials for bilayer lithography: The case of poly-dimethyl siloxane.

A. Tserepi, G. Cordoyiannis, G. Patsis, V. Costantoudis, E. Gogolides, E. Valamontes, D. Eon, M. Peignon, C. Cardinaud and G. Turban.

J. Vac. Sci. Techol. B 21(1), 174 -182 (2003).

[30] Surface roughness induced by plasma etching of Si-containing polymers.

A. Tserepi,  E. Gogolides, V. Constantoudis, G. Cordoyiannis, I. Raptis and E. S. Valamontes

J. Adhesion Scien. & Technol., 17(8), 1083-1091 (2003).

[31] Fractal Roughness Of Polymers after Lithographic Processing.

Vassilios Constantoudis, Evangelos Gogolides, Vassilios Sarris,C. Diakoumakos, George Patsis, Angeliki Tserepi, Evangelos S. Valamontes

Japanese Journal of Applied Physics Letters, PT. 2, Vol. 44, No. 5A, L186 - L189, (2005).

[32] Comparison of Back-Foil SXRF and EPMA for the Elemental

Characterization of Thin Coatings.

E. S. Valamontes and J. C. Statharas

Vacuum 77, 371-376, (2005).

[33] Proton beam micromachining on strippable aqueous base developable negative resist.

I. Rajta, E. Baradács, M. Chatzichristidi, E. S. Valamontes, I. Uzonyi, I. Raptis

Nucl. Instr. and Meth. B 231/1-4, 423, (2005).

[34] Dissolution properties of ultrathin photoresist films with multiwavelength interferometry.

A. Kokkinis, E. S. Valamontes, I. Raptis

Journal of Physics, CS10, 401, (2005).

[35] Proton beam micromachining on strippable aqueous base developable negative resist.

I. Rajta, E. Baradács, M. Chatzichristidi, E. S. Valamontes, I. Uzonyi, I. Raptis

Hungarian Academy of Sciences Ann. Rep., 7.1, 15, (2004).

[36] Interstitial injection in silicon after high dose, low energy Arsenic implantation and annealing.

C. Tsamis, D. Skarlatos, G. BenAssayag,  A. Claverie,W. Lerch and V.Valamontes

Applied Physics Letters 87, 201903 (2005).

[37] Tailoring the surface topography and wetting properties of oxygen-plasma treated poly-dimethyl siloxane.

A. Tserepi,  E. Gogolides, V. Constantoudis, K. Tsougeni, N. Vourdas, E. S. Valamontes

Journal of Applied Physics 98, 113502, (2005).

[38] Injection of point defects during annealing of low energy As implanted silicon.

C. Tsamis, D. Skarlatos, V. Valamontes, D. Tsoukalas, G. BenAssayag, A. Claverie and W. Lerch

Materials Science and Engineering 124, 261-265,(2005).

[39] Vapor sorption in thin supported polymer films studied by white light  interferometry.

Kyriaki Manoli, Dimitris Goustouridis, Stellios Chatzandroulis, Ioannis Raptis, Evangelos S.Valamontes, Merope Sanopoulou.

Polymer 47, 6117-6122, (2006).

[40] Scanning X-ray micro.uorescence in a SEM for the analysis of very thin overlayers.

E. S. Valamontes, J. C. Statharas, C. Nomicos.

Nucl. Instr. and Meth. B 260 (2007) 628-632.

[41] Proton Beam Micromachined Buried Microchannels in Negative Tone Resist Materials.

I. Rajta, M. Chatzichristidi, E. Baradács, C. Cserháti, I. Raptis, K. Manoli, E. S. Valamontes

Nucl. Instr. and Meth. B 260 (2007) 414-418.

[42] High aspect ratio micro/nano machining with proton beam writing on aqueous developable – easily stripped negative chemically amplified resists.

M. Chatzichristidi, E. Valamontes, N. Tsikrikas, P. Argitis, I. Raptis, J.A.van Kan, F. Zhang, F. Watt

Microelectronic Engineering 85 (5-6) (2008) pp. 945-948.

[43] Molecular weight and processing effects on the dissolution properties of thin poly(methyl methacrylate) films.

A. Kokkinis, E. S. Valamontes, D. Goustouridis, Th. Ganetsos, K. Beltsios and I. Raptis

Microelectronic Engineering 85 (1) (2008) pp. 93-99.

[44] Aqueous base developable: easy stripping, high aspect ratio negative photoresist for optical and proton beam lithography.

M. Chatzichristidi, I. Rajta, Th. Speliotis, E. Valamontes, D. Goustouridis, P. Argitis, I. Raptis

Microsyst Technol 14 (9-11) (2008) pp. 1423-1428.

[45] Realization and simulation of high aspect ratio micro/nano structures by proton beam writing.

E. Valamontes, M. Chatzichristidi, N. Tsikrikas, D. Goustouridis, I. Raptis, J.A. van Kan, F. Watt

Japanese Journal of Applied Physics 47 (11) (2008) pp. 8600-8605.

[46] Vapor- Induced Swelling Of Supported Methacrylic And Siloxane Polymer Films: Determination Of Interaction Parameters

Kyriaki Manoli, Dimitris Goustouridis, Ioannis Raptis, Evangelos Valamontes, Merope Sanopoulou

Journal of Applied Polymer Science (submitted)